TAMURA Naoyoshi | Process Development Department, Technology Development Division, Semiconductor Group, Fujitsu Ltd.

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• Process Development Department, Technology Development Division, Semiconductor Group, Fujitsu Ltd.の論文著者

Process Development Department, Technology Development Division, Semiconductor Group, Fujitsu Ltd. | 論文

• Interface Roughness Produced by Nitrogen Atom Incorporation at a SiO_2/Si(100) Interface : Semiconductors

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