Tsuchiya Norihiko | Process and Manufacturing Engineering Center, Toshiba Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

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• Process and Manufacturing Engineering Center, Toshiba Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japanの論文著者

Process and Manufacturing Engineering Center, Toshiba Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan | 論文

• Nanoscale Stress Field Evaluation with Shallow Trench Isolation Structure Assessed by Cathodoluminescence Spectroscopy, Raman Spectroscopy, and Finite Element Method Analyses

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