TOMIOKA Kei | Design Center, Toshiba Corporation
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概要
論文 | ランダム
- Roles of SiH_3 and SiH_2 Radicals in Particle Growth in rf Silane Plasmas
- Effects of Dilution Gases on Si Atoms and SiHx^^+ (X = 0-3) Ions in Electron Cyclotron Resonance SiH_4 Plasmas
- Holographic Measurement of Lower Loss Tangent Using a Beam of Variable Cross Section(2nd Report) -Measuring Theory-
- Etching and Surface Modification of GaAs by Hydrogen Radicals Generated by Hydrogen Microwave Afterglow Method
- Holographic Measurement of Lower Loss Tangent Using a Beam of Variable Cross Section(1st Report)-Calculation and Measurement of Amplitude Distribution-