Shih Hsi-Fu | Opto-Electronics & Systems Labs., Industrial Technology Research Institute:Institute of Optical Sciences, National Central University
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概要
- 同名の論文著者
- Opto-Electronics & Systems Labs., Industrial Technology Research Institute:Institute of Optical Sciences, National Central Universityの論文著者
論文 | ランダム
- Effect of N2 Gas Flow Ratio in Plasma-Enhanced Chemical Vapor Deposition with SiH4–NH3–N2–He Gas Mixture on Stress Relaxation of Silicon Nitride
- Effect of DC Bias Voltage on the Characteristics of Low Temperature Silicon–Nitride Films Deposited by Internal Linear Antenna Inductively Coupled Plasma Source
- Fabrication of Epitaxial Silicon Thin Films for Solar Cells by Low-Temperature Reactive Thermal Chemical Vapor Deposition Technique
- Taxonomic Study on Four Southeast Asian Species of the Genus Xestocephalus (Auchenorrhyncha, Cicadellidae)
- Effect of N2O Flow Rate on Reliability of SiOx Films Deposited by SiH4–N2O Gas Mixture Plasma