Nagashima K | Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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概要
Matsushita Electric Industrial Co. Ltd. Osaka Jpn | 論文
- Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductuvely-Coupled Plasma
- Lower Temperature Deposition of Polycrystalline Silicon Films from a Modified Inductively Coupled Silane Plasma
- Energy Distribution of Ion-Induced Secondary Electrons from MgO Surface
- Preparation of Ge_Cy Alloys by C Implantation into Ge Crystal and Their Raman Spectra : Semiconductors
- Infrared Absorption Spectra of C Local Mode in Si_Ge_xC_y Crystals : Semiconductors