宮下 英士 | 永仁会病院外科
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概要
論文 | ランダム
- Effects of Etch Rate on Plasma-Induced Damage to Porous Low-$k$ Films
- Plasma Chemistry of Octafluorocyclopentene/Argon/Oxygen Mixtures
- Preparation and Characterization of Amorphous Fluorinated Carbon Film Using Low-Global-Warming-Potential Gas, C4F6, by Plasma-Enhanced Chemical Vapor Deposition
- Source Gas Dependency of Amorphous Fluorinated Carbon Film Properties Prepared by Plasma Enhanced Chemical Vapor Deposition Using C4F8, C4F6, and C5F8 Gases
- Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C4F6, by Plasma Enhanced Chemical Vapor Deposition