横山 隆三 | Asian Institute of Technology P.O. Box 4

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• 横山 隆三の詳細を見る
• 同名の論文著者
• Asian Institute of Technology P.O. Box 4の論文著者

論文 | ランダム

• A New Approach to Reducing Line-Edge Roughness by Using a Cross-Linked Positive-Tone Resist
• Novel Proximity Effect Including Pattern-Dependent Resist Development in Electron Beam Nanolithography
• Sub-10-nm Si Lines Fabricated Using Shifted Mask Patterns Controlled with Electron Beam Lithography and KOH Anisotropic Etching
• Fabrication of One-Dimensional Silicon Nanowire Structures with a Self-Aligned Point Contact
• Critical Dimension Measurement in Nanometer Scale by Using Scanning Probe Microscopy

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