Terada Yoshihiro | Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology, 2–12–1 O–okayama, Meguro–ku, Tokyo 152, Japan

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概要

• Terada Yoshihiroの詳細を見る
• 同名の論文著者
• Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology, 2–12–1 O–okayama, Meguro–ku, Tokyo 152, Japanの論文著者

論文 | ランダム

• [NiFe]ヒドロゲナーゼ成熟化因子群の構造生物学
• Improvement of in-plane anisotropy field in FeCoB/NiFe/Si thin films by Kr sputtering
• Improvement of soft magnetic properties of Si/NiFe/FeCoB thin films at gigahertz band frequency range by multilayer configuration
• NiFeのナノ接点における新磁気抵抗効果
• Reduction of switching fields of submicrometer sized magnetic tunnel junction with NiFe-based synthetic ferrimagnetic free layer

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