Flad Michael | 独国ＦＺＫ
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概要
論文 | ランダム
- Molten KOH Etching with Na2O2 Additive for Dislocation Revelation in 4H-SiC Epilayers and Substrates
- Modulating the Residual Stress of Ion-Assisted TiO2 Films during Annealing with Film Thickness and Substrate Temperature
- Anodic Aluminum Oxide Diodes
- Optimum Thickness of Al2O3 Support Layer for Growth of Singlewalled Carbon Nanotubes
- Reactive Ion Etching of Carbon Nanowalls