Akamatsu Yasuhiko | Process Development Department, Wafer Process Engineering Development Division, LSI Manufacturing Unit, Renesas Technology Corporation
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概要
- 同名の論文著者
- Process Development Department, Wafer Process Engineering Development Division, LSI Manufacturing Unit, Renesas Technology Corporationの論文著者
論文 | ランダム
- Effect of Surface Treatments on Adsorption and Tribology of the Diamond-Like-Carbon Layer for Metal-Evaporated Tape
- Changes in Raman Spectra with Deposition Conditions and Plasma Treatment of Diamond Like Carbon Thin Films
- Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics
- Analysis of Columnar Microstructure in Fe-N Thin Films Prepared by an Ion-Assisted Vapor Deposition Method
- Effect of Bias Addition on the Gap-Filling Properties of Fluorinated Amorphous Carbon Thin Films Grown by Helicon Wave Plasma-Enhanced Chemical Vapor Deposition