Sasase Iwao | Dept. of Information and Computer Sciences, Keio University
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概要
論文 | ランダム
- 次世代CVD・ALD向け液体材料 (特集 半導体次世代キープロセスと新材料)
- Hydrogenated Microcrystalline Silicon Film Growth by Inductively Coupled Plasma-Chemical Vapor Deposition on ZrO2 Gate Dielectric for Thin Film Transistors (Special Issue: Active-Matrix Liquid-Crystal Displays--TFT Technologies and Related Materials)
- Application of HfSiON to Deep-Trench Capacitors of Sub-45-nm-Node Embedded Dynamic Random-Access Memory (Special Issue: Solid State Devices & Materials)
- 原子層成長(ALD)装置 (全冊特集 新プロセスに対応する半導体製造・試験装置と材料) -- (半導体製造装置・周辺機器)
- A Comparison of Al2O3/HfO2 and Al2O3/ZrO2 Bilayers Deposited by the Atomic Layer Deposition Method for Potential Gate Dielectric Applications