West John | Liquid Crystal Institute, Kent State University, Kent, Ohio, 44242, U.S.A.
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概要
論文 | ランダム
- Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248nm and Dry/Wet 193nm Resists
- Enzymatic Synthesis of Spacer-Linked Divalent Glycosides Carrying N-Acetylglucosamine and N-Acetyllactosamine : Analysis of Cross-Linking Activities with WGA
- Difference between acid generation mechanisms in poly(hydroxystyrene)- and polyacrylate-based chemically amplified resists upon exposure to extreme ultraviolet radiation
- Isolation and Characterization of a β-Primeverosidase-Like Enzyme from Penicillium multicolor