Nishi Kenichi | OptoElectronics and High Frequency Device Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba, Ibaraki 305, Japan

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• Nishi Kenichiの詳細を見る
• 同名の論文著者
• OptoElectronics and High Frequency Device Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba, Ibaraki 305, Japanの論文著者

OptoElectronics and High Frequency Device Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba, Ibaraki 305, Japan | 論文

• Improvement in Electrical Properties at an n-GaAs/n-GaAs Regrown Interface Using Ammonium Sulfide Treatment

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