Kuriyama Atsushi | Frontier Collaborative Research Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan

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Frontier Collaborative Research Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan | 論文

• Effect of Post-Metallization Annealing on Electrical Characteristics of La2O3 Gate Thin Films

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