AKIMOTO Hajime | Department of Nuclear Engineering Tokai Research Establishment, Japan Atomic Energy Research Institute Received May 22, 1990
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- Department of Nuclear Engineering Tokai Research Establishment, Japan Atomic Energy Research Institute Received May 22, 1990の論文著者
論文 | ランダム
- Behavior of Hydrogen in Excimer Laser Annealing of Hydrogen-Modulation-Doped Amorphous Silicon Layer
- Properties of Nanocrystalline Cubic Silicon Carbide Thin Films Prepared by Hot-Wire Chemical Vapor Deposition Using SiH4/CH4/H2 at Various Substrate Temperatures
- Numerical Analysis of Crack Tip Plasticity and History Effects under Mixed Mode Conditions
- 半導体用特殊ガス--市場・業界動向 NF3/SiH4や既存製品の需要が拡大 安定供給体制の構築が一段と重要に (特集 ガス・除害装置・関連機器)
- Optical Characteristics of Hydrogenated Amorphous Silicon Carbide Films Prepared at Various Gas Flow Rate Ratios