TOMITA FUSAO | Laboratory of Applied Microbiology, Graduate School of Agriculture, Hokkaido University, North 9 West 9, Kita-ku, Sapporo 060-8589, Japan
スポンサーリンク
概要
- TOMITA FUSAOの詳細を見る
- 同名の論文著者
- Laboratory of Applied Microbiology, Graduate School of Agriculture, Hokkaido University, North 9 West 9, Kita-ku, Sapporo 060-8589, Japanの論文著者
論文 | ランダム
- Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose Separation by Implanted Oxygen (SIMOX) Substrates Fabricated by Internal Thermal Oxidation (ITOX) Process
- Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose SIMOX Structures
- Evaluation of Fixed Charge and Interface Trap Densities in SIMOX Wafers and Their Effects on Device Characteristics
- Current-Path Observation in Low-Dose SIMOX (Separation by Implanted Oxygen) Buried-SiO_2 Layer
- Dislocation Density Reduction in SIMOX (Separation by Implanted Oxygen) Multi-Energy Single Implantation