Fujimura Yukihiro | Department of Functional Materials and Science, Faculty of Engineering, Saitama University, 255 Shimo-Okubo, Saitama 338-8570, Japan

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• 同名の論文著者
• Department of Functional Materials and Science, Faculty of Engineering, Saitama University, 255 Shimo-Okubo, Saitama 338-8570, Japanの論文著者

Department of Functional Materials and Science, Faculty of Engineering, Saitama University, 255 Shimo-Okubo, Saitama 338-8570, Japan | 論文

• Formation of Si:H:Cl Films at Low Temperatures of 90–140°C by RF Plasma-Enhanced Chemical Vapor Deposition of a SiH2Cl2 and H2 Mixture

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