藤井 貴浩 | (社) 中部建設協会
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概要
論文 | ランダム
- 理事会から
- Suppression of Oxygen Impurity Incorporation into Silicon Films Prepared from Surface-Wave Excited H_2/SiH_4 Plasma
- Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma
- Lower-Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductively Coupled Silane Plasma
- Simple Direct Monitoring of SiH_3 Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy